Hot embossing in polymers as a direct way to pattern resist

In this work, we investigated the possibilities of Hot Embossing Lithography as a new nanoreplication technique. Different structures with feature sizes down to 50 nm were successfully replicated into a resist over an area of up to 10 cm(2). These polymer structures were then further transferred into a hard material by means of two different pattern transfer techniques. The aspect ratio and the shape of the various replicated nanostructures were monitored throughout the process by means of scanning electron and force microscopies.