The fabrication and application of Zernike electrostatic phase plate

被引：23

作者：

Huang, Sen-Hui ^{[1
]}

Wang, Wan-Jhih

Chang, Chia-Seng

Hwu, Yeu-Kuang

Tseng, Fan-Gang

Kai, Ji-Jung

Chen, Fu-Rong

机构：

[1] Natl Tsing Hua Univ, Ctr Electron Microscopy, Dept Engn & Syst Sci, Hsinchu 30043, Taiwan

[2] Acad Sinica, Inst Phys, Taipei 11529, Taiwan

[3] Natl Tsing Hua Univ, Inst Microelectromech Syst, Hsinchu 30043, Taiwan

[4] Natl Synchrotron Radiat Res Ctr, Hsinchu 30076, Taiwan

来源：

JOURNAL OF ELECTRON MICROSCOPY | 2006年 / 55卷 / 06期

关键词：

Zernike electrostatic phase plate; electrostatic force microscope; phase contrast; phase-shifting device; Einzel lens; Rose criterion;

D O I：

10.1093/jmicro/dfl037

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

The Zernike electrostatic phase plate (ZEPP) consisting of three ring electrodes and two insulating rings has been fabricated using Micro Electro-Mechanical System processes. The electrostatic field produced in the phase plate was measured by electrostatic force microscopy. The electrostatic field and focal length of the phase plate is calculated using electron optics principles. The comparison of the experimental electrostatic field and the theoretical calculated is discussed. Finally, we report the application of ZEPP to enhance contrast of the SiONx/SiO2 interface in an NMOS semiconductor device. The quantitative analysis of the contrast enhancement versus the applied bias is discussed in detail.

引用

页码：273 / 280

页数：8

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