Nanofacet lithography: A new bottom-up approach to nanopatterning and nanofabrication by soft replication of spontaneously faceted crystal surfaces

被引：45

作者：

Gabai, Rachel ^{[1
]}

Ismach, Ariel ^{[1
]}

Joselevich, Ernesto ^{[1
]}

机构：

[1] Weizmann Inst Sci, Dept Mat & Interfaces, IL-76100 Rehovot, Israel

来源：

ADVANCED MATERIALS | 2007年 / 19卷 / 10期

关键词：

D O I：

10.1002/adma.200601625

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The faceting of unstable crystal surfaces provides self-assembling templates for soft lithography, enabling the facile generation of a variety of periodic nanopatterned monolayers, nanowires, nanogrooves, nanogrids, and nanowaffles of An and Si (the figure shows the replication of faceted sapphire to an elastomeric stamp, and then to a patterned self-assembled monolayer).

引用

页码：1325 / +

页数：7

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