Characterization of two by two electron-beam microcolumn array aligned with field emission array

被引：11

作者：

Park, JY ^{[1
]}

Lera, JD ^{[1
]}

Choi, HJ ^{[1
]}

Buh, GH ^{[1
]}

Kang, CJ ^{[1
]}

Jung, JH ^{[1
]}

Choi, SS ^{[1
]}

Jeon, D ^{[1
]}

Kuk, Y ^{[1
]}

机构：

[1] Seoul Natl Univ, Dept Phys, Seoul 151742, South Korea

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1998年 / 16卷 / 02期

关键词：

D O I：

10.1116/1.589915

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A two by two electron microcolumn array aligned with held emission array (FEA) was fabricated based on our electron-beam simulation. The spherical and chromatic aberrations, that affect the spot size of the e-beam, are highly dependent on the alignment of the electrostatic microlenses. A laser micromachining technique was used for making a self-aligned microcolumn. A FEA with a designed size and spacing was aligned and bonded to the microcolumn. The I-V and current stabilities of the microcolumn were measured and the field emission pattern of highly focused e-beam was obtained. The application of focused electron beam or ion beam for lithography and miniaturized scanning electron microscopy are suggested, (C) 1998 American Vacuum Society. [S0734-211X(98)08602-8].

引用

页码：826 / 828

页数：3

共 14 条

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