Fabrication of multiple microcolumn array combined with field emission array

被引:14
作者
Park, JY [1 ]
Lera, JD
Yakshin, MA
Choi, SS
Lee, Y
Chun, KJ
Lee, JD
Jeon, D
Kuk, Y
机构
[1] Seoul Natl Univ, Dept Phys, Seoul 151742, South Korea
[2] Sun Moon Univ, Dept Phys, Chungnam 336840, South Korea
[3] Seoul Natl Univ, Dept Elect Engn, Seoul 151742, South Korea
[4] Myong Ji Univ, Dept Phys, Seoul 449728, South Korea
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1997年 / 15卷 / 06期
关键词
D O I
10.1116/1.589720
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We made a multiple electron microcolumn array. The electron source was made of either a Si based field emission array or a nickel coated array to keep the distances among sources equal. Laser micromachining was used to obtain a self-aligned microcolumn with five lenses: an extractor, an accelerator, and an Einzel lens. The aberration of each column was greatly improved compared to anodically bonded Si lens microcolumns. The field emission electron beam pattern was obtained from a multiple microcolumn. Its I-V dependence and possible application to the electron beam lithography with high throughput is discussed. (C) 1997 American Vacuum Society.
引用
收藏
页码:2749 / 2753
页数:5
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