Miniature Schottky electron source

被引:29
作者
Kim, HS
Yu, ML
Kratschmer, E
Hussey, BW
Thomson, MGR
Chang, THP
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1995年 / 13卷 / 06期
关键词
D O I
10.1116/1.588023
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A miniature Schottky electron source has been developed and evaluated for applications in a new generation of scanning tunneling microscope aligned field emission microcolumns. Both the physical dimensions and the heating power of this source have been significantly reduced from a conventional source of the same kind. Operating parameters for such a source in a microcolumn environment in terms of emission characteristics, suppressor operating range, etc., have been evaluated. Test results show that very good emission stability at greater than or equal to 100 mu A emission current over several hours, and axial angular current densities in excess of 100 mu A/sr can be obtained. Energy distributions have been measured using a carefully calibrated analyzer, and the results show a full width at half-maximum of 0.4 to 0.76 eV for a 0.3 mu m radius Schottky source operating over an angular current density range of 1 to over 100 mu A/sr. A significant change in the shape of the energy distribution was observed over this range of operation, indicating evidence of tunneling currents at the high angular current density regime. (C) 1995 American Vacuum Society.
引用
收藏
页码:2468 / 2472
页数:5
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共 12 条
  • [1] TOTAL ENERGY-DISTRIBUTIONS OF FIELD-EMITTED ELECTRONS AT HIGH-CURRENT DENSITY
    BELL, AE
    SWANSON, LW
    [J]. PHYSICAL REVIEW B, 1979, 19 (07): : 3353 - 3364
  • [2] A SCANNING TUNNELING MICROSCOPE CONTROLLED FIELD-EMISSION MICROPROBE SYSTEM
    CHANG, THP
    KERN, DP
    MCCORD, MA
    MURAY, LP
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (02): : 438 - 443
  • [3] MICROMINIATURIZATION OF ELECTRON-OPTICAL SYSTEMS
    CHANG, THP
    KERN, DP
    MURAY, LP
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (06): : 1698 - 1705
  • [4] CONTRIBUTION TO GENERAL ANALYSIS OF FIELD-EMISSION
    ELKAREH, AB
    WOLFE, JC
    WOLFE, JE
    [J]. JOURNAL OF APPLIED PHYSICS, 1977, 48 (11) : 4749 - 4753
  • [5] OXYGEN PROCESSED FIELD-EMISSION TIPS FOR MICROCOLUMN APPLICATIONS
    KIM, HS
    YU, ML
    STAUFER, U
    MURAY, LP
    KERN, DP
    CHANG, THP
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2327 - 2331
  • [6] EVALUATION OF ZR/O/W SCHOTTKY EMITTERS FOR MICROCOLUMN APPLICATIONS
    KIM, HS
    KRATSCHMER, E
    YU, ML
    THOMSON, MGR
    CHANG, THP
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (06): : 3413 - 3417
  • [7] Miniature three-axis micropositioner for scanning proximal probe and other applications
    Kleindiek, S
    Kim, HS
    Kratschmer, E
    Chang, THP
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06): : 2653 - 2656
  • [8] An electron-beam microcolumn with improved resolution, beam current, and stability
    Kratschmer, E
    Kim, HS
    Thomson, MGR
    Lee, KY
    Rishton, SA
    Yu, ML
    Chang, THP
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06): : 2498 - 2503
  • [9] SUB-40 NM RESOLUTION 1 KEV SCANNING TUNNELING MICROSCOPE FIELD-EMISSION MICROCOLUMN
    KRATSCHMER, E
    KIM, HS
    THOMSON, MGR
    LEE, KY
    RISHTON, SA
    YU, ML
    CHANG, THP
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (06): : 3503 - 3507
  • [10] FIELD ELECTRON CATHODE STABILITY STUDIES - ZIRCONIUM-TUNGSTEN THERMAL-FIELD CATHODE
    SWANSON, LW
    MARTIN, NA
    [J]. JOURNAL OF APPLIED PHYSICS, 1975, 46 (05) : 2029 - 2030