An electron-beam microcolumn with improved resolution, beam current, and stability

被引:66
作者
Kratschmer, E
Kim, HS
Thomson, MGR
Lee, KY
Rishton, SA
Yu, ML
Chang, THP
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1995年 / 13卷 / 06期
关键词
D O I
10.1116/1.588381
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have built and tested a 1 keV electron-beam microcolumn that focuses 1 nA of beam current into a 10 nm full width half-maximum beam diameter at a working distance of 1 mm. The electron source is a miniaturized Zr/O/W Schottky field emitter with 150 mu A/sr angular emission current density operating at about 1800 K at a distance of only 100 mu m from a silicon membrane extractor electrode, The actual microcolumn is 3.5 mm long assembled mainly from silicon membrane electrodes. Improved einzel lens design and fabrication allowed the operation of this beam focusing element in the accelerating mode. Spherical and chromatic aberrations were reduced by factors of about 2-3, respectively, as compared to he retarding lens mode. Excellent beam current stability with less than 1% variation over several hours has been observed. (C) 1995 American Vacuum Society.
引用
收藏
页码:2498 / 2503
页数:6
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