Silver induced faceting of Si(112)

被引:7
作者
Nabbefeld, T. [1 ]
Wiethoff, C.
Heringdorf, F. -J. Meyer Zu
Horn-von Hoegen, M.
机构
[1] Univ Duisburg Essen, Dept Phys, D-47057 Duisburg, Germany
关键词
atomic force microscopy; catalysis; elemental semiconductors; liquid phase epitaxial growth; low energy electron diffraction; nanofabrication; nanowires; semiconductor growth; semiconductor quantum wires; silicon; silver; solid phase epitaxial growth; surface structure; vapour phase epitaxial growth; SCANNING-TUNNELING-MICROSCOPY; ENERGY-ELECTRON DIFFRACTION; SILICON NANOWIRES; GROWTH; SURFACE; MECHANISM;
D O I
10.1063/1.3464555
中图分类号
O59 [应用物理学];
学科分类号
摘要
Si nanowires grown in ultrahigh vacuum by metal-catalyzed vapor-liquid-solid epitaxy are known to exhibit sidewalls with {112}-type orientation. For some metals the sidewalls show pronounced faceting. Ag induced faceting on Si {112} surfaces was studied in situ by spot-profile-analyzing low energy electron diffraction and ex situ atomic force microscopy. The (112) surface decomposes into (115)- and (111)-(root 3 x root 3)-facets, both of which are Ag terminated. The width of the facets is kinetically limited and varies between 6 nm at T < 550 degrees C and 30 nm at T = 690 degrees C. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3464555]
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页数:3
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