Sampling the diffusion paths of a neutral vacancy in silicon with quantum mechanical calculations -: art. no. 205202

被引:81
作者
El-Mellouhi, F
Mousseau, N
Ordejón, P
机构
[1] Univ Montreal, Dept Phys, Montreal, PQ H3C 3J7, Canada
[2] Univ Montreal, Regrp Quebecois Mat Pointe, Montreal, PQ H3C 3J7, Canada
[3] Univ Autonoma Barcelona, CSIC, Inst Ciencia Mat Barcelona, E-08193 Barcelona, Spain
基金
加拿大自然科学与工程研究理事会;
关键词
D O I
10.1103/PhysRevB.70.205202
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report a first-principles study of vacancy-induced self-diffusion in crystalline silicon. Starting from a fully relaxed configuration with a neutral vacancy, we proceed to search for local diffusion paths. The diffusion of the vacancy proceeds by hops to first nearest neighbor with an energy barrier of 0.40 eV in agreement with experimental results. Competing mechanisms are identified, such as the reorientation, and the recombination of dangling bonds by Wooten-Winer-Weaire process.
引用
收藏
页码:205202 / 1
页数:9
相关论文
共 63 条
[1]  
Agullo-Lopez F., 1988, POINT DEFECTS MAT
[2]   Lattice distortions and electronic structure in the negative silicon vacancy [J].
Anderson, FG ;
Ham, FS ;
Grossmann, G .
PHYSICAL REVIEW B, 1996, 53 (11) :7205-7216
[3]   Systematic generation of finite-range atomic basis sets for linear-scaling calculations [J].
Anglada, E ;
Soler, JM ;
Junquera, J ;
Artacho, E .
PHYSICAL REVIEW B, 2002, 66 (20) :1-4
[4]   Vacancy in silicon revisited: Structure and pressure effects [J].
Antonelli, A ;
Kaxiras, E ;
Chadi, DJ .
PHYSICAL REVIEW LETTERS, 1998, 81 (10) :2088-2091
[5]   Event-based relaxation of continuous disordered systems [J].
Barkema, GT ;
Mousseau, N .
PHYSICAL REVIEW LETTERS, 1996, 77 (21) :4358-4361
[6]   SILICON SELF-INTERSTITIAL MIGRATION - MULTIPLE PATHS AND CHARGE STATES [J].
BARYAM, Y ;
JOANNOPOULOS, JD .
PHYSICAL REVIEW B, 1984, 30 (04) :2216-2218
[7]   SEMIEMPIRICAL MODIFIED EMBEDDED-ATOM POTENTIALS FOR SILICON AND GERMANIUM [J].
BASKES, MI ;
NELSON, JS ;
WRIGHT, AF .
PHYSICAL REVIEW B, 1989, 40 (09) :6085-6100
[8]   1ST-PRINCIPLES CALCULATIONS OF SELF-DIFFUSION CONSTANTS IN SILICON [J].
BLOCHL, PE ;
SMARGIASSI, E ;
CAR, R ;
LAKS, DB ;
ANDREONI, W ;
PANTELIDES, ST .
PHYSICAL REVIEW LETTERS, 1993, 70 (16) :2435-2438
[9]  
BOURGOIN J, 1981, POINT DEFECTS IS SEM, V1
[10]  
BOURGOIN J, 1981, POINT DEFECTS IS SEM, V2