Investigation of the mechanical properties of thin films by nanoindentation, considering the effects of thickness and different coating-substrate combinations

被引:144
作者
Chen, SH [1 ]
Liu, L [1 ]
Wang, TC [1 ]
机构
[1] Chinese Acad Sci, Inst Mech, LNM, Beijing 100080, Peoples R China
基金
中国国家自然科学基金;
关键词
nanoindentation; mechanical property; coating and substrate;
D O I
10.1016/j.surfcoat.2004.03.037
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In order to further investigate nanoindentation data of film-substrate systems and to learn more about the mechanical properties of nanometer film-substrate systems, two kinds of films on different substrate systems have been tested with a systematic variation in film thickness and substrate characteristics. The two kinds of films are aluminum and tungsten, which have been sputtered on to glass and silicon substrates, respectively. Indentation experiments were performed with a Nano Indent XP II with indenter displacements typically about two times the nominal film thicknesses. The resulting data are analyzed in terms of load-displacement curves and various comparative parameters, such as hardness, Young's modulus, unloading stiffness and elastic recovery. Hardness and Young's modulus are investigated when the substrate effects are considered. The results show how the composite hardness and Young's modulus are different for different substrates, different films and different film thicknesses. An assumption of constant Young's modulus is used for the film-substrate system, in which the film and substrate have similar Young's moduli. Composite hardness obtained by the Joslin and Oliver method is compared with the directly measured hardness obtained by the Oliver and Pharr method. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:25 / 32
页数:8
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