Light trapping in ultrathin plasmonic solar cells

被引：543

作者：

Ferry, Vivian E. ^{[1
,2
]}

Verschuuren, Marc A. ^{[3
]}

Li, Hongbo B. T. ^{[4
]}

Verhagen, Ewold ^{[1
]}

Walters, Robert J. ^{[1
]}

Schropp, Ruud E. I. ^{[4
]}

Atwater, Harry A. ^{[2
]}

Polman, Albert ^{[1
]}

机构：

[1] FOM Inst AMOLF, Ctr Nanophoton, NL-1098 XG Amsterdam, Netherlands

[2] CALTECH, Thomas J Watson Labs Appl Phys, Pasadena, CA 91125 USA

[3] Philips Res Labs, NL-5656 AE Eindhoven, Netherlands

[4] Univ Utrecht, Sect Nanophoton, Debye Inst Nanomat Sci, NL-3508 TA Utrecht, Netherlands

来源：

OPTICS EXPRESS | 2010年 / 18卷 / 13期

关键词：

LITHOGRAPHY; TECHNOLOGY; GRATINGS; DEVICES; FILMS; TCO; CVD;

D O I：

10.1364/OE.18.00A237

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We report on the design, fabrication, and measurement of ultrathin film a-Si: H solar cells with nanostructured plasmonic back contacts, which demonstrate enhanced short circuit current densities compared to cells having flat or randomly textured back contacts. The primary photocurrent enhancement occurs in the spectral range from 550 nm to 800 nm. We use angle-resolved photocurrent spectroscopy to confirm that the enhanced absorption is due to coupling to guided modes supported by the cell. Full-field electromagnetic simulation of the absorption in the active a-Si: H layer agrees well with the experimental results. Furthermore, the nanopatterns were fabricated via an inexpensive, scalable, and precise nanopatterning method. These results should guide design of optimized, non-random nanostructured back reflectors for thin film solar cells. (C) 2010 Optical Society of America

引用

页码：A237 / A245

页数：9

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