Shear modulation force microscopy study of near surface glass transition temperatures

被引：251

作者：

Ge, S ^{[1
]}

Pu, Y

Zhang, W

Rafailovich, M

Sokolov, J

Buenviaje, C

Buckmaster, R

Overney, RM

机构：

[1] SUNY Stony Brook, Dept Mat Sci & Engn, Stony Brook, NY 11794 USA

[2] Univ Washington, Dept Chem Engn, Seattle, WA 98195 USA

来源：

PHYSICAL REVIEW LETTERS | 2000年 / 85卷 / 11期

关键词：

D O I：

10.1103/PhysRevLett.85.2340

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

We report results of glass transition (T-x) measurements for polymer thin films using atomic force microscopy (AFM). The AFM mode, shear modulation force microscopy (SMFM), involves measuring the temperature-dependent shear force on a tip modulated parallel to the sample surface. Using this method we have measured the surface T-g of thin (17-500 nm) polymer Films and found that T-g is independent of film thickness (t > 17 nm), strength of substrate interactions, or even presence of substrate.

引用

页码：2340 / 2343

页数：4

共 30 条

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