Effects of thermal annealing of ZnO layers grown by MBE

被引:141
作者
Ogata, K [1 ]
Sakurai, K
Fujita, S
Fujita, S
Matsushige, K
机构
[1] Kyoto Univ, Venture Business Lab, Kyoto 6068501, Japan
[2] Kyoto Univ, Dept Elect Sci & Engn, Kyoto 6068501, Japan
关键词
ZnO; MBE; thermal annealing; electron carrier density; mobility;
D O I
10.1016/S0022-0248(00)00099-3
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Thermal annealing of ZnO layers was done in N-2 or O-2 atmosphere and their effects were studied. Electron carrier density increases according to reevaporation of O from ZnO if annealed in N-2 atmosphere. On the contrary, it decreases from the order of 10(18) to 10(17) cm(-3) and also optical properties are improved when annealed in O-2 atmosphere at lower temperature. In that case, the number of interstitial Zn (Zn-i) and O vacancies (V-O) decrease, probably because the effective incorporation of O atom diminishes those donor levels. The crystallinity also improves with the annealing. The mobilities of the layer increase up to 51 cm(2)/V s as annealing temperature increases, but are lower at lower temperatures. Solving this problem, annealing may become a promising technique for the fabrication of p-type ZnO layers. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:312 / 315
页数:4
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