Low refractive index Si nanopillars on Si substrate

被引：54

作者：

Lin, Gong-Ru

Chang, Ya-Chung

Liu, En-Shao

Kuo, Hao-Chung

Lin, Huang-Shen

机构：

[1] Natl Taiwan Univ, Grad Inst Electroopt, Taipei 106, Taiwan

[2] Natl Taiwan Univ, Dept Elect Engn, Taipei 106, Taiwan

[3] Acad Sinica, Res Ctr Appl Sci, Taipei 115, Taiwan

[4] Natl Chiao Tung Univ, Dept Photon, Hsinchu 300, Taiwan

来源：

APPLIED PHYSICS LETTERS | 2007年 / 90卷 / 18期

关键词：

D O I：

10.1063/1.2736281

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Low refractive index of a stalagmitelike high-aspect-ratio Si nanopillar array on Si dry etched using a self-aggregated Ni nanodot mask is demonstrated, which exhibits two minimum reflectances of 1.23 and 1.4 with corresponding refractive indices of 1.25 and 1.48 at 400 and 1200 nm, respectively. Angular dependency of the transverse electrical mode reflectance at 632.8 nm of the surface roughened Si nanopillar array is released, and the Brewster angle of 63 degrees with equivalent refractive index of 1.5 is determined. (C) 2007 American Institute of Physics.

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页数：3

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