Modeling of gas dynamics for a laser-generated plasma: Propagation into low-pressure gases

被引:79
作者
Le, HC
Zeitoun, DE
Parisse, JD
Sentis, M
Marine, W
机构
[1] Univ Aix Marseille 1, IUSTI, CNRS UMR 6595, F-13453 Marseille 13, France
[2] Fac Sci Luminy, IRPHE, CNRS UMR 6594, F-13288 Marseille, France
[3] Fac Sci Luminy, GPEC, CNRS UMR 6631, F-13288 Marseille 09, France
来源
PHYSICAL REVIEW E | 2000年 / 62卷 / 03期
关键词
D O I
10.1103/PhysRevE.62.4152
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The physical phenomena involved during three-dimensional axisymmetric laser-induced plasma expansion into background gas are numerically studied. For this purpose, a multispecies hydrodynamic model is developed which considers the effects of mass and ambipolar diffusions, thermal conduction, viscosity, and nonequilibrium conditions for ionization. This model is applied to describe quantitatively the Si plasma plume expansion into Ar or He gases. It is shown that the mechanism of plasma expansion depends critically on both the pressure and mass of the background gas. The shock front expansion is found to be strongly correlated with ion dynamics. A pronounced difference between heavy-particle and electron temperatures indicates a persistent lack of equilibrium between the heavy particle and the electron in the plasma plume expansion. The Si atoms of the rarefied plume are essentially driven by the backward-moving background gas as a result of a mass diffusion process. It is also noted that the diffusion processes are only important in the last expansion stage, and are less significant in the first stage. Therefore, it is shown that a computation which does not include diffusion effects (Euler equations) can adequately describe only the earliest stage of plasma expansion into background gas. The ability of the Navier-Stokes hydrodynamic multispecies model to predict the key role of the background gas type (Ar, He) and pressure is demonstrated.
引用
收藏
页码:4152 / 4161
页数:10
相关论文
共 25 条
[1]   GAS-DYNAMICS AND FILM PROFILES IN PULSED-LASER DEPOSITION OF MATERIALS [J].
ANISIMOV, SI ;
BAUERLE, D ;
LUKYANCHUK, BS .
PHYSICAL REVIEW B, 1993, 48 (16) :12076-12081
[2]  
BORIS JP, 1992, FLUID DYN RES, V10, P199, DOI 10.1016/0169-5983(92)90023-P
[3]   DYNAMICS OF LASER-INDUCED PLUME EXPANSION INTO AN AMBIENT GAS DURING FILM DEPOSITION [J].
BULGAKOV, AV ;
BULGAKOVA, NM .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1995, 28 (08) :1710-1718
[4]  
Chrisey D. B., 1994, PULSED LASER DEPOSIT
[5]   TRANSPORT PROPERTIES OF MULTICOMPONENT GAS MIXTURES [J].
CURTISS, CF ;
HIRSCHFELDER, JO .
JOURNAL OF CHEMICAL PHYSICS, 1949, 17 (06) :550-555
[6]   SPECTROSCOPIC AND ION PROBE MEASUREMENTS OF KRF LASER ABLATED Y-BA-CU-O BULK SAMPLES [J].
DYER, PE ;
GREENOUGH, RD ;
ISSA, A ;
KEY, PH .
APPLIED PHYSICS LETTERS, 1988, 53 (06) :534-536
[7]  
GAUTHIER JC, 1983, J PHYS D, V15, P32
[8]   Numerical study of the role of a background gas and system geometry in pulsed laser deposition [J].
Itina, TE ;
Katassonov, AA ;
Marine, W ;
Autric, M .
JOURNAL OF APPLIED PHYSICS, 1998, 83 (11) :6050-6054
[9]  
KEE RJ, UNPUB
[10]  
LE HC, 1996, APPL SURF SCI, V76, P96