Electrical characterization of a trilayer germanium nanocrystal memory device

被引:10
作者
Ho, V
Tay, MS
Moey, CH
Teo, LW
Choi, WK
Chim, WK
Heng, CL
Lei, Y
机构
[1] Natl Univ Singapore, Dept Elect & Comp Engn, Microelect Lab, Singapore 117576, Singapore
[2] Singapore MIT Alliance, Adv Mat Micro & Nanosyst, Singapore 117576, Singapore
关键词
memory; germanium; nanocrystal; capacitance-voltage (C-V);
D O I
10.1016/S0167-9317(03)00021-2
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, we report the effects of the thickness of the middle layer and the rapid thermal oxide (RTO) layer on the charge storage capability of the trilayer devices. The capacitance versus voltage (C-V) measurements showed that devices with a thinner middle layer and the same thickness for the RTO layer have better charge storage capability (i.e., larger C-V hysteresis). For devices with the same middle layer thickness, a larger C-V hysteresis was observed from devices with a thinner RTO layer. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:33 / 38
页数:6
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