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Interface roughness scattering in AlAs/InGaAs resonant tunneling diodes with an InAs subwell
被引:29
作者:
Roblin, P
[1
]
Potter, RC
[1
]
Fathimulla, A
[1
]
机构:
[1] ALLIED SIGNAL AEROSP CO,MICROELECTR & TECHNOL CTR,COLUMBIA,MD 21045
基金:
美国国家科学基金会;
关键词:
D O I:
10.1063/1.361104
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
We present simulation results on the current-voltage (I-V) characteristics of an InP-based AlAs/InGaAs resonant tunneling diode (RTD) with InAs subwell. Space-charge limited transport is accounted for using a self-consistent electrostatic potential calculated using the Hartree approximation. Three-dimensional scattering is simulated using the recently developed multiple sequential scattering theory. Interface roughness scattering is found to be dominant over polar phonon scattering in the devices studied. Of particular interest is interface-roughness (IR) scattering at the InGaAs/AlAs and InGaAs/InAs interfaces and its impact on the valley current. The existence of a critical terrace size that maximizes IR scattering is identified through simulation. The origin of the asymmetry commonly measured in the RTD I-V characteristic is discussed with respect to asymmetries in interface scattering. The use of the InAs subwell and associated interface roughness scattering to tune the peak current while keeping a nearly constant current peak-to-valley ratio is demonstrated. (C) 1996 American Institute of Physics.
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页码:2502 / 2508
页数:7
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