Kinetically controlled chemical sensing using micromachined structures

被引:103
作者
Semancik, S [1 ]
Cavicchi, R [1 ]
机构
[1] NIST, Chem Sci & Technol Lab, Gaithersburg, MD 20899 USA
关键词
D O I
10.1021/ar970071b
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
[No abstract available]
引用
收藏
页码:279 / 287
页数:9
相关论文
共 20 条
[1]  
BALTES H, 1997, INT ELECT DEV M, P521
[2]  
BRYZEK J, 1994, IEEE SPECTRUM MAY, P20
[3]  
CAVICCHI R, 1994, Patent No. 5356756
[4]   FAST TEMPERATURE-PROGRAMMED SENSING FOR MICRO-HOTPLATE GAS SENSORS [J].
CAVICCHI, RE ;
SUEHLE, JS ;
KREIDER, KG ;
GAITAN, M ;
CHAPARALA, P .
IEEE ELECTRON DEVICE LETTERS, 1995, 16 (06) :286-288
[5]   GROWTH OF SNO2 FILMS ON MICROMACHINED HOTPLATES [J].
CAVICCHI, RE ;
SUEHLE, JS ;
KREIDER, KG ;
SHOMAKER, BL ;
SMALL, JA ;
GAITAN, M ;
CHAPARALA, P .
APPLIED PHYSICS LETTERS, 1995, 66 (07) :812-814
[6]   OXYGEN VACANCIES AND DEFECT ELECTRONIC STATES ON THE SNO2(110)-1X1 SURFACE [J].
COX, DF ;
FRYBERGER, TB ;
SEMANCIK, S .
PHYSICAL REVIEW B, 1988, 38 (03) :2072-2083
[7]  
KUNT T, 1997, P ADCHEM 97, P91
[8]   Silicon microstructuring technology [J].
Lang, W .
MATERIALS SCIENCE & ENGINEERING R-REPORTS, 1996, 17 (01) :1-55
[9]  
Madou M., 1997, Fundamentals of Microfabrication
[10]  
Madou M. J., 1989, CHEM SENSING SOLID S