Carbon nanotubes growth by chemical vapor deposition using thin film nickel catalyst

被引：59

作者：

Moshkalyov, SA

Moreau, ALD

Guttiérrez, HR

Cotta, MA

Swart, JW

机构：

[1] Univ Estadual Campinas, Ctr Semicond Components, BR-13083970 Campinas, SP, Brazil

[2] Univ Estadual Campinas, IFGW, LPD, BR-13083970 Campinas, SP, Brazil

来源：

MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 2004年 / 112卷 / 2-3期

基金：

巴西圣保罗研究基金会;

关键词：

chemical vapor deposition; carbon nanotubes; catalyst; nickel;

D O I：

10.1016/j.mseb.2004.05.038

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The results of a study of multi-walled carbon nanotubes (CNTs) growth using two different chemical vapor deposition (CVD) techniques (low pressure plasma enhanced and atmospheric pressure thermal CVD) are presented. Thin films of Ni were used as a catalyst. The process of nickel nanoparticles formation during thermal pre-treatment of the catalyst was studied using AFM in a non-contact mode. The effect of different gases used for the catalyst surface pre-treatment (N-2, H-2 or NH3) was also analyzed. Higher density of nucleation and growth was obtained using hydrogen and ammonia. The results show the critical importance of the initial stage of nanotubes nucleation. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：147 / 153

页数：7