Achieving 63pm resolution in scanning transmission electron microscope with spherical aberration corrector

被引:50
作者
Sawada, Hidetaka
Hosokawai, Fumio
Kaneyama, Toshikatsu
Ishizawa, Toshihiro
Terao, Mitsuhisa
Kawazoe, Muneyuki
Sannomiya, Takumi
Tomita, Takeshi
Kondo, Yukihito
Tanaka, Takayuki
Oshima, Yoshifumi
Tanishiro, Yasumasa
Yamamoto, Naoki
Takayanagi, Kunio
机构
[1] Japan Sci & Technol Agcy, CREST, Kawaguchi, Saitama 3320012, Japan
[2] JEOL Ltd, Akishima, Tokyo 1968558, Japan
[3] Tokyo Inst Technol, Meguro Ku, Tokyo 1528551, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2007年 / 46卷 / 20-24期
关键词
aberration correction; electron microscope; high resolution; dark field image;
D O I
10.1143/JJAP.46.L568
中图分类号
O59 [应用物理学];
学科分类号
摘要
The performance of a newly developed high-resolution 300 kV microscope equipped with a spherical aberration corrector for probe-forming systems is reported. This microscope gave the highest resolution for the distance between atomic columns, as determined by a high-angle annular dark field imaging method using a GaN[211] crystalline specimen, where the distance between the neighboring columns of Ga was 63pm.
引用
收藏
页码:L568 / L570
页数:3
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