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Microdischarge devices with 10 or 30 μm square silicon cathode cavities:: pd scaling and production of the XeO excimer
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作者:

Park, SJ
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机构: Univ Illinois, Dept Elect & Comp Engn, Lab Opt Phys & Engn, Urbana, IL 61801 USA

Eden, JG
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机构: Univ Illinois, Dept Elect & Comp Engn, Lab Opt Phys & Engn, Urbana, IL 61801 USA

Chen, J
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机构: Univ Illinois, Dept Elect & Comp Engn, Lab Opt Phys & Engn, Urbana, IL 61801 USA

Liu, C
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机构: Univ Illinois, Dept Elect & Comp Engn, Lab Opt Phys & Engn, Urbana, IL 61801 USA
机构:
[1] Univ Illinois, Dept Elect & Comp Engn, Lab Opt Phys & Engn, Urbana, IL 61801 USA
[2] Univ Illinois, Dept Elect & Comp Engn, Lab Micromech Actuators Sensors & Syst, Urbana, IL 61801 USA
关键词:
D O I:
10.1063/1.1825061
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Silicon microplasma devices with square trench cathode cavities having cross sections of (10 mum)(2) or (30 mum)(2) and a depth of 200 mum have been fabricated and operated successfully in the rare gases and Xe/O-2 mixtures at pressures (300 K) up to 1100 Torr. The (10 mum)(2) structures exhibit electrical characteristics that contrast with the behavior of larger devices and may indicate the onset of the breakdown of pd scaling. Also, a distinct minimum in the ignition voltage of 10 mum square devices is observed for pdsimilar or equal to0.9 Torr cm (p and d are the Ne gas pressure and microcavity cross-sectional dimension, respectively). Strong emission on the 2 (1)Sigma(+)-->1 (1)Sigma(+) transition of XeO in the green (similar to510-560 nm) is observed in mixtures of Xe (300-700 Torr) and O-2 (1-10 mTorr). (C) 2004 American Institute of Physics.
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页码:4869 / 4871
页数:3
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