共 21 条
[4]
PROXIMITY EFFECT IN ELECTRON-BEAM LITHOGRAPHY
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1975, 12 (06)
:1271-1275
[5]
ARRAYED MINIATURE ELECTRON-BEAM COLUMNS FOR HIGH THROUGHPUT SUB-100 NM LITHOGRAPHY
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1992, 10 (06)
:2743-2748
[6]
Lossless layout compression for maskless lithography systems
[J].
EMERGING LITHOGRAPHIC TECHNOLOGIES IV,
2000, 3997
:467-477
[7]
Use of microfabricated cold field emitters in sub-100 nm maskless lithography
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
2001, 19 (03)
:862-865
[10]
GUILLORN MA, IN PRESS J VAC SCI B