Residual gas analysis of a dc plasma for carbon nanofiber growth

被引：17

作者：

Cruden, BA ^{[1
]}

Cassell, AM ^{[1
]}

Hash, DB ^{[1
]}

Meyyappan, M ^{[1
]}

机构：

[1] NASA, Ames Res Ctr, Ctr Nanotechnol, Moffett Field, CA 94035 USA

来源：

JOURNAL OF APPLIED PHYSICS | 2004年 / 96卷 / 09期

基金：

美国国家航空航天局;

关键词：

D O I：

10.1063/1.1779975

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report the analysis of a plasma enhanced chemical vapor deposition process for carbon nanofiber growth. A direct current (dc) plasma is employed with a mixture of acetylene and ammonia. Residual gas analysis is performed on the downstream plasma effluent to determine degrees of precursor dissociation and high molecular weight species formation. Results are correlated to growth quality obtained in the plasma as a function of dc voltage/power, gas mixture, and pressure. Behaviors in plasma chemistry are understood through application of a zero-dimensional model. (C) 2004 American Institute of Physics.

引用

页码：5284 / 5292

页数：9

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