X-ray section topographic investigation of the growth process of SiC crystals

被引:8
作者
Milita, S
Madar, R
Baruchel, J
Mazuelas, A
机构
[1] ESRF, F-38043 Grenoble, France
[2] ENSPG, CNRS, LMGP, UMR 5628 INPG, F-38402 St Martin Dheres, France
来源
SILICON CARBIDE, III-NITRIDES AND RELATED MATERIALS, PTS 1 AND 2 | 1998年 / 264-2卷
关键词
crystal growth; X-ray section topography;
D O I
10.4028/www.scientific.net/MSF.264-268.29
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We study the growth process of SiC crystals by synchrotron radiation section topography. In general, we observe the enlargement of the main crystal which grows above the seed at the expense of the small crystallites which surround it. At an initial moment of the growth we also observe the crystallites with a common axis to increase in size at the expense of the randomly oriented crystallites, these later finally disappearing, The bigger crystallites with an orientation similar to the main crystal are connected to the main crystal by a continuously deformed region.
引用
收藏
页码:29 / 32
页数:4
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