Determination of flux ionization fraction using a quartz crystal microbalance and a gridded energy analyzer in an ionized magnetron sputtering system

被引：42

作者：

Green, KM ^{[1
]}

Hayden, DB ^{[1
]}

Juliano, DR ^{[1
]}

Ruzic, DN ^{[1
]}

机构：

[1] Univ Illinois, Urbana, IL 61801 USA

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1997年 / 68卷 / 12期

关键词：

D O I：

10.1063/1.1148430

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A diagnostic which combines a quartz crystal microbalance (QCM) and a gridded energy analyzer has been developed to measure the metal flux ionization fraction in a modified commercial de magnetron sputtering device. The sensor is mounted on a linear motion feedthrough and embedded in a slot in the substrate plane to allow for measuring the uniformity in deposition and ionization throughout the plane of the wafer. Radio-frequency (rf) power is introduced through a coil to ionize the Al atoms. The metal flux ionization fraction at the QCM is determined by comparing the total deposition rate with and without a bias that screens out the ions, but that leaves the plasma undisturbed. By varying the voltage applied to the grids, the plasma potential is determined. At a pressure of 35 mTorr, a magnetron power of 2 kW, and a net rf power of 310+/-5 W, 78+/-5% ionization was found. (C) 1997 American Institute of Physics.

引用

页码：4555 / 4560

页数：6