Process development for improved soft X-ray zone plates

被引：7

作者：

Reinspach, J. ^{[1
]}

Lindblom, M. ^{[1
]}

van Hofsten, O. ^{[1
]}

Bertilson, M. ^{[1
]}

Hertz, H. M. ^{[1
]}

Holmberg, A. ^{[1
]}

机构：

[1] Royal Inst Technol, Dept Appl Phys, S-10691 Stockholm, Sweden

来源：

MICROELECTRONIC ENGINEERING | 2010年 / 87卷 / 5-8期

关键词：

Zone plate; Electroplating; Diffraction efficiency;

D O I：

10.1016/j.mee.2009.11.012

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We demonstrate two nanofabrication methods which improve the diffraction efficiency of high-resolution soft X-ray nickel zone plates. First, pulse electroplating is shown to result in uniform diffraction efficiency over the entire zone-plate area. A resulting enhancement of the total efficiency of 20% compared to conventional DC plating was measured. Second, we demonstrate that a high-resolution cold development process can be combined with efficiency-enhancing dry etching into an underlying germanium film. We present 16 nm half-pitch gratings composed of 50 nm nickel on top of 50 nm germanium. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：1583 / 1586

页数：4

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