Structural study of a low dielectric thin film using X-ray reflectivity and grazing incidence small angle X-ray scattering

被引:17
作者
Hsu, CH [1 ]
Jeng, US
Lee, HY
Huang, CM
Liang, KS
Windover, D
Lu, TM
Jin, C
机构
[1] Natl Synchrotron Radiat Res Ctr, Hsinchu, Taiwan
[2] Rensselaer Polytech Inst, Ctr Integrated Elect Elect Mfg & Electron Media, Troy, NY USA
[3] Texas Instruments Inc, Dallas, TX USA
关键词
X-ray scattering; structural properties; dielectrics;
D O I
10.1016/j.tsf.2004.07.062
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have studied the structure of a high-porous silica thin film with pore sizes in nanometer scale using X-ray reflectivity and small angle X-ray scattering in grazing incidence geometry. The reflectivity data provide the information of surface and interface characteristics, density-depth profile, and porosity of the xerogel film. Whereas the grazing incidence small angle X-ray scattering results reveal the internal structure of the porous film, including pore shape and size, and averaged inter-pore spacing. It is demonstrated that the combination of these two techniques is a powerful structural characterization tool to porous thin films. (C) 2004 Elsevier B.V All rights reserved.
引用
收藏
页码:323 / 327
页数:5
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