Influence of the PACVD process parameters on the properties of titanium carbide thin films

被引:22
作者
Jarms, C
Stock, HR [1 ]
Berndt, H
Bartsch, K
Leonhardt, A
Arnold, B
机构
[1] Stiftung Inst Werkstofftech, D-28359 Bremen, Germany
[2] Inst Festkorper & Werkstofforsch, D-01171 Dresden, Germany
关键词
plasma-assisted CVD; titanium carbide; plasma parameter;
D O I
10.1016/S0257-8972(97)00296-X
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Wear-resistant titanium carbide (TiC) coatings were deposited by plasma-assisted chemical vapour deposition on high-speed steel. The influence of the partial pressure ratio of methane and titanium tetrachloride (p(CH4)/p(TiCl4)), the plasma voltage and the pulse/pause ratio on the composition and properties of the TIC coatings have been investigated. Small partial pressure ratios p(CH4)/p(TiCl4) up to about 15 result in nearly stoichiometric TiC coatings at high plasma voltage. Higher partial pressure ratios cause excess carbon, which is bound as C-C or C-H. An increasing carbon content was found also for both increasing plasma voltage and increasing pulse/pause ratio. The layer hardness was found to decrease with increasing excess carbon. No significant influence of composition on the friction coefficient has been detected. (C) 1998 Elsevier Science S.A.
引用
收藏
页码:1547 / 1552
页数:6
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