The influence of energetic bombardment on the structure and properties of epitaxial SrRuO3 thin films grown by pulsed laser deposition

被引:70
作者
Maria, JP [1 ]
Trolier-McKinstry, S
Schlom, DG
Hawley, ME
Brown, GW
机构
[1] Penn State Univ, Dept Mat Sci & Engn, Intercoll Mat Res Lab, University Pk, PA 16802 USA
[2] Univ Calif Los Alamos Natl Lab, Ctr Mat Sci, Los Alamos, NM 87545 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.367195
中图分类号
O59 [应用物理学];
学科分类号
摘要
SrRuO3 epitaxial thin films were prepared by pulsed laser deposition (PLD) under a range of growth conditions to study the impact of bombardment on properties. Growth conditions favoring energetic bombardment resulted in SrRuO3 films with expanded in-plane and out-of-plane lattice constants. In particular, SrRuO3 films with pseudocubic out-of-plane lattice constants as large as 4.08 Angstrom were deposited (3.8% larger than the bulk value). Those films with expanded lattices had greater resistivities and depressed Curie transition temperatures. The relative lattice mismatch between film and substrate was found to temper the effect of bombardment such that as the mismatch increased, a higher degree of bombardment was required to produce extended lattice parameters. The pressure-dependent energetic species inherent to PLD and their interaction with the ambient are believed to be the source of the bombarding flux. Further experiments confirmed that in the range of 20-200 mTorr, oxygen/ozone partial pressure had a negligible effect on the film properties. (C) 1998 American Institute of Physics.
引用
收藏
页码:4373 / 4379
页数:7
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