Surface-initiated polymerization on nanopatterns fabricated by electron-beam lithography

被引：117

作者：

Ahn, SJ

Kaholek, M

Lee, WK

LaMattina, B

LaBean, TH

Zauscher, S ^{[1
]}

机构：

[1] Duke Univ, Dept Mech Engn & Mat Sci, Durham, NC 27708 USA

[2] Duke Univ, Ctr Biol Inspired Mat & Mat Syst, Durham, NC 27708 USA

[3] Duke Univ, Dept Comp Sci, Durham, NC 27708 USA

[4] Army Res Off, Res Triangle Pk, NC 27709 USA

来源：

ADVANCED MATERIALS | 2004年 / 16卷 / 23-24期

关键词：

D O I：

10.1002/adma.200401055

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Micro- and nanopatterns of polymer brushes (see Figure) are fabricated using a "top-down/bottom-up" approach. A silicon surface is patterned with gold using lift-off electron-beam lithography ("top-down"), and the resulting pattern is then amplified by surf ace-initiated atom-transfer radical polymerization ("bottom-up") of N-isopropylacrylamide from an immobilized thiol initiator.

引用

页码：2141 / +

页数：6

共 38 条

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