Assignment of rest-atom surface core-level shift through adsorption-site selectivity of methoxy on Si(111)-7x7

被引：23

作者：

Piancastelli, MN

Paggel, JJ

Weindel, C

Hasselblatt, M

Horn, K

机构：

[1] UNIV MARBURG,FACHBEREICH PHYS,D-35032 MARBURG,GERMANY

[2] UNIV MARBURG,WISSENSCH ZENTRUM MAT WISSENSCH,D-35032 MARBURG,GERMANY

[3] UNIV ROMA TOR VERGATA,DEPT CHEM SCI & TECHNOL,I-00133 ROME,ITALY

来源：

PHYSICAL REVIEW B | 1997年 / 56卷 / 20期

关键词：

D O I：

10.1103/PhysRevB.56.R12737

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The formation of the methoxy species on Si(111)-(7x7) upon methanol adsorption leads to a strongly selective extinction of the rest-atom feature in the valence-level photoemission spectrum. The Si 2p surface core level at lowest binding energy is likewise removed in this process, demonstrating that this feature is related to charge distribution around the rest atom, an assignment that has been subject to controversy in the literature. The formation of a Si-O bond upon methoxy adsorption leads to marked changes in the Si 2p spectrum that are discussed in terms of the characteristics of this chemisorption bond.

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页码：12737 / 12740

页数：4

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