X-ray absorption and infrared reflectance of poled silica glass for second harmonic generation

被引:15
作者
Nazabal, V
Fargin, E
Le Flem, G
Briois, V
Moulin, CCD
Buffeteau, T
Desbat, B
机构
[1] ICMCB, CNRS, UPR 9048, F-33608 Pessac, France
[2] Univ Paris Sud, LURE, UMR 130, F-91898 Orsay, France
[3] Univ Paris 06, LCIM2, CNRS, ESA 4071, F-75252 Paris, France
[4] Univ Bordeaux 1, LPCM, CNRS, UMR 5803, F-33405 Talence, France
关键词
D O I
10.1063/1.1321786
中图分类号
O59 [应用物理学];
学科分类号
摘要
Structural alterations induced by a thermal poling treatment which is at the origin of second harmonic generation in a Herasil silica glass are studied by x-ray absorption near-edge spectroscopy (XANES). Multiple scattering calculations are performed to explain the experimental O-K edge XANES shape of unpoled surfaces of the glass and then to interpret modifications resulting from poling. The observations are consistent with emergence of disorder by breaking Si-O bridging bonds which are not completely removed by a thermal depoling treatment. Fourier transform infrared spectroscopy shows modifications of nonbridging oxygen bonds which are coherent with a model involving a protons migration during poling. Moreover, a partial anisotropy in the direction of the electrostatic field which is applied during the poling treatment is observed. (C) 2000 American Institute of Physics. [S0021-8979(00)08423-1].
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页码:6245 / 6251
页数:7
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