Textured ZnO thin films for solar cells grown by a two-step process with the atomic layer deposition technique

B-doped ZnO films are prepared on Corning 7059 glass by atomic layer deposition (ALD) using diethylzinc (DEZn), H2O as reactant gases, and diborane (B2H6) as a dopant gas. A two-step deposition process is introduced to grow textured and low-resistivity ZnO films by combining the ALD and conventional photo-induced metalorgainc chemical vapor deposition (photo-MOCVD) techniques. The electrical and optical properties of ZnO films are effectively improved by depositing lower-resistivity ALD-ZnO films on the textured photo-MOCVD-ZnO films while the textured surface morphologies are well maintained. Furthermore, the resistivity of the ALD-ZnO film was further improved by the two-step process and a low resistivity of 2.0 x 10(-4) Ohm.cm was achieved for the film which was only about 400 nm thick.