Controlled shift of the optical resonance of fully processed asymmetric Fabry-Perot modulator arrays

We present two ways to shift the Fabry-Perot resonance of processed asymmetric Fabry-Perot modulator arrays: being wet chemical etching and off-axis incident light. These methods can be used to tune the resonance wavelength, contrast, on-state reflectivity or voltage to an optimal value for specific applications after growth and definition of the arrays. In particular, the etch process is optimized to obtain a reproducible cavity thickness and retain the reflection homogeneity across an array. We further compare the results of the etching technique to the shift of the spectra as a function of the angle of the incident light on the arrays. This demonstrates a more efficient exciton absorption for off-axis incident light and confirms that the etch process does not degrade the characteristics of the modulator.