A SRAM design on 65nm CMOS technology with integrated leakage reduction scheme

被引:46
作者
Zhang, K [1 ]
Bhattacharya, U [1 ]
Chen, Z [1 ]
Hamzaoglu, F [1 ]
Murray, D [1 ]
Vallepalli, N [1 ]
Wang, Y [1 ]
Zheng, B [1 ]
Bohr, M [1 ]
机构
[1] Intel Corp, Portland Technol Dev, Hillsboro, OR 97124 USA
来源
2004 SYMPOSIUM ON VLSI CIRCUITS, DIGEST OF TECHNICAL PAPERS | 2004年
关键词
D O I
10.1109/VLSIC.2004.1346592
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
A 4Mb SRAM is designed and fabricated on a 65nm CMOS technology. It features a 0.57 mum(2) 6T cell with large noise margin down to 0.7V for low-voltage operation. The fully synchronized subarray contains an integrated leakage reduction scheme with sleep transistor. It also has a built-in programmable defect "screen" circuit for high volume manufacturing.
引用
收藏
页码:294 / 295
页数:2
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