Deuterium retention in carbides and doped graphites

被引:53
作者
Mayer, M [1 ]
Balden, M [1 ]
Behrisch, R [1 ]
机构
[1] Max Planck Inst Plasma Phys, EURATOM Assoc, D-85748 Garching, Germany
关键词
D O I
10.1016/S0022-3115(97)00299-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The retention of 1 keV and 8 keV deuterium implanted in B, Si, and Ti doped graphites and in the carbides B4C, SiC and TiC up to 6.7 X 10(19) D atoms/cm(2) has been studied at room temperature with thermal desorption spectroscopy (TDS) and ion beam analysis. Compared to pyrolytic graphite all doped graphites showed a tendency to increased retention of deuterium, especially the materials with high porosity. For the carbides the saturation concentration in the implantation zone in B4C is about 0.4 D per target atom and therefore comparable to the saturation concentration of D in graphite. SiC exhibits a significant higher saturation concentration of 0.6 D per target atom, whereas TIC shows a significant lower saturation concentration of 0.15 D per target atom. (C) 1998 Elsevier Science B.V.
引用
收藏
页码:55 / 62
页数:8
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