Comparison of TiN, ZrN and CrN hard nitride coatings: Electrochemical and thermal oxidation

被引：297

作者：

Milosev, I ^{[1
]}

Strehblow, HH ^{[1
]}

Navinsek, B ^{[1
]}

机构：

[1] UNIV DUSSELDORF,INST PHYS CHEM & ELECTROCHEM,D-40225 DUSSELDORF,GERMANY

来源：

THIN SOLID FILMS | 1997年 / 303卷 / 1-2期

关键词：

hard coatings; valence band; nitrides; physical vapour deposition (PVD); x-ray photoelectron spectroscopy (XPS);

D O I：

10.1016/S0040-6090(97)00069-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Although TiN has hitherto been the most extensively investigated hard coating, other binary and ternary nitrides are the subject of ever-increasing interest. In this work the behaviour of TiN. ZrN and CrN coatings is compared. concentrating on the mechanism of their oxidation. The sequence of the processes included in the electrochemical and thermal oxidation was followed by X-ray photoelectron spectroscopy (XPS). It is shown that the behaviour of TiN and ZrN coatings is qualitatively similar. whereas CrN exhibits a quite different behaviour. Valence band spectra of these nitrides and their related oxides are presented and discussed. (C) 1997 Elsevier Science S.A.

引用

页码：246 / 254

页数：9

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