Deep levels in SiC:V by high temperature transport measurements

被引:12
作者
Mitchel, WC [1 ]
Perrin, R
Goldstein, J
Roth, M
Ahoujja, M
Smith, SR
Evwaraye, AO
Solomon, JS
Landis, G
Jenny, J
Hobgood, HM
Augustine, G
Balakrishna, V
机构
[1] USAF, Res Lab, Wright Patterson AFB, OH 45433 USA
[2] Univ Dayton, Dayton, OH 45469 USA
[3] Northrop Grumman Corp, Ctr Sci & Technol, Pittsburgh, PA 15235 USA
来源
SILICON CARBIDE, III-NITRIDES AND RELATED MATERIALS, PTS 1 AND 2 | 1998年 / 264-2卷
关键词
vanadium doping; Hall effect; semi-insulating material;
D O I
10.4028/www.scientific.net/MSF.264-268.545
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Vanadium doped 6H and 4H SiC have been studied with high temperature Hall effect and resistivity, optical absorption and SIMS. The 6H samples were found to exhibit three thermal activation energies, 0.35 eV, 0.7 eV and near mid-gap. The 0.3 eV level is due to thermal ionization of residual uncompensated boron. We attribute the mid-gap level to thermal ionization of the vanadium donor level. The 0.7 eV activation is believed to be due to transfer of electrons from the ionized vanadium acceptor levels to the conduction band. These results suggest that the vanadium donor and acceptor levels are located at E-c - 1.42 eV and E-V + 2.4 eV respectively.
引用
收藏
页码:545 / 548
页数:4
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