Electronic properties of cesium-covered GaN(0001) surfaces

被引:45
作者
Kampen, TU [1 ]
Eyckeler, M [1 ]
Monch, W [1 ]
机构
[1] Gerhard Mercator Univ Duisburg, Festkorperphys Lab, D-47048 Duisburg, Germany
关键词
negative electron affinity; work function; ionization energy; gallium nitride; cesium;
D O I
10.1016/S0169-4332(97)00495-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Cesium was deposited on clean n-GaN(0001)-1 x 1 surfaces at 150 K using Cs dispensers, X-ray photoemission spectroscopy showed that the Cs-films grow layer by layer. Cesium-induced variations of electronic surface properties were observed using photoemission spectroscopy with monochromatized HeI radiation (UPS) and a Kelvin probe (CPD), The UPS data recorded with clean GaN(0001) surfaces give their ionization energy as 6.8 +/- 0.1 eV, so that their electron affinity measures 3.35 +/- 0.1 eV. The work function of clean GaN(0001) surfaces was determined as 4 +/- 0.2 eV. Cesium deposition first reduces the work function by up to 2.7 eV and then increases it until eventually a work function of 2 eV is reached. A simple point-charge model easily explains this decrease of the work function by the formation of surface dipoles. The latter value is characteristic of bulk cesium. (C) 1998 Elsevier Science B.V.
引用
收藏
页码:28 / 32
页数:5
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