Nanoscale ferromagnetic rings fabricated by electron-beam lithography

被引：60

作者：

Heyderman, LJ ^{[1
]}

David, C

Kläui, M

Vaz, CAF

Bland, JAC

机构：

[1] Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland

[2] Univ Cambridge, Cavendish Lab, Cambridge CB3 0HE, England

来源：

JOURNAL OF APPLIED PHYSICS | 2003年 / 93卷 / 12期

关键词：

D O I：

10.1063/1.1577224

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have fabricated nanoscale ferromagnetic rings using electron-beam lithography with a lift-off process for pattern transfer. The resist thickness and electron-beam dose were tailored to produce 10 nm thick rings with outer diameters down to 90 nm. Arrays of rings were produced for magneto-optical Kerr effect measurements which show that down to the smallest diameters, reproducible magnetic switching into the flux-closure vortex state is maintained. (C) 2003 American Institute of Physics.

引用

页码：10011 / 10013

页数：3

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