High-purity, ultrahigh-resolution calixarene electron-beam negative resist

被引:12
作者
Manako, S
Ochiai, Y
Yamamoto, H
Teshima, T
Fujita, J
Nomura, E
机构
[1] NEC Corp Ltd, Fundamental Res Labs, Tsukuba, Ibaraki 3058501, Japan
[2] Tokuyama Corp, Tsukuba Res Ctr, Tsukuba, Ibaraki 3050024, Japan
[3] Clariant Tokuyama Ltd, Tokuyama, Yamaguchi 7450024, Japan
[4] NEC Corp Ltd, Fundamental Res Labs, Tsukuba, Ibaraki 3058501, Japan
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2000年 / 18卷 / 06期
关键词
D O I
10.1116/1.1321274
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Calixarene is a promising high-resolution negative electron-beam resist having a resolution of the order of 10 nm because of its low molecular weight. We have made a purified calixarene resist containing metal contaminants whose concentrations are measured in parts per billion and which therefore do not degrade the performance of silicon-based electron devices. The purity of the calixarene itself was also improved and we obtained high-purity calix[6]arene find high-purity calix[7]arene, both of which contain the main component, which is more than 95% of all the calixarene present. The resolution of both purified calixarene resists is almost the same as that of the unpurified calixarene, but the sensitivity of calix[7]arene is higher than that of calix[6]arene because its molecular weight is higher. (C) 2000 American Vacuum Society. [S0734-211X(oo)11406-4].
引用
收藏
页码:3424 / 3427
页数:4
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