Scanning capacitance microscopy measurement of two-dimensional dopant profiles across junctions

被引:46
作者
Kopanski, JJ [1 ]
Marchiando, JF
Berning, DW
Alvis, R
Smith, HE
机构
[1] NIST, Div Semicond Elect, Gaithersburg, MD 20899 USA
[2] Adv Micro Devices Inc, Sunnyvale, CA 94088 USA
[3] Digital Equipment Corp, Hudson, MA 01749 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1998年 / 16卷 / 01期
关键词
D O I
10.1116/1.589807
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Cross-sectioned p(+)/p and p-n junction test structures were imaged with a scanning capacitance microscope (SCM). To maintain a constant difference capacitance, our SCM utilizes an electronic attenuator circuit with a dynamic range of 20 V to less than 1 mV. Dopant profiles are extracted from SCM images using a formalism, which rapidly determines the theoretical SCM response from a database of calculated C-V curves. A dopant profile from a p(+)/p junction determined via constant difference capacitance SCM is compared to a secondary ion mass spectroscopy profile from similar structures.
引用
收藏
页码:339 / 343
页数:5
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