Pattern formation through selective chemical transformation of imine group of self-assembled monolayer by low-energy electron beam

被引：26

作者：

Jung, YJ

La, YH

Kim, HJ

Kang, TH

Ihm, K

Kim, KJ

Kim, B

Park, JW

机构：

[1] Pohang Univ Sci & Technol, Div Mol & Life Sci, Dept Chem, Ctr Integrated Mol Syst, Pohang 790784, South Korea

[2] Pohang Univ Sci & Technol, Pohang Accelerator Lab, Pohang 790784, South Korea

来源：

LANGMUIR | 2003年 / 19卷 / 10期

关键词：

D O I：

10.1021/la027059z

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Chemical transformation of the imine group of the benzaldine monolayer was observed when low-energy electron beam irradiation was used. The reactivity of the restored amine group at the unexposed region was confirmed. The characteristic reaction caused by the electron beam was applied successfully for the patterning of the surface. It was found that the new method is as effective as the e-beam induced nitro group reduction in terms of the resolution and the immobilization efficiency.

引用

收藏

页码：4512 / 4518

页数：7

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