Surface structure on Ar+-ion irradiated graphite by scanning probe microscopy

被引：18

作者：

An, B

Fukuyama, S

Yokogawa, K ^{[1
]}

Yoshimura, M

机构：

[1] MITI, AIST, Chugoku Natl Ind Res Inst, Hiroshima 7370197, Japan

[2] Toyota Technol Inst, Nagoya, Aichi 4688511, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2000年 / 39卷 / 6B期

关键词：

STM; AFM; surface structure; ion bombardment; graphite; annealing;

D O I：

10.1143/JJAP.39.3732

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The surface structure of a highly oriented pyrolytic graphite (HOPG), irradiated by Ar+ ions with an ion energy of 0,5-1.0keV at doses below 5 x 10(11) ions/cm(2) during annealing, was characterized by scanning probe microscopy. The ion-induced hillocks were observed by both scanning tunneling microscopy (STM) and atomic force microscopy (AFM) after the ion irradiation, the heights of which, measured by STM, were larger than that measured by AFM in the tapping mode. The hillocks were recovered distinguishably by annealing above 470 K. Almost 85% of the hillocks disappeared after annealing at 1270 K and they disappeared completely after annealing above 1770 K. The behavior of defects produced by ion-irradiation in HOPG during annealing is discussed.

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页码：3732 / 3735

页数：4

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