Flow behavior at the embossing stage of nanoimprint lithography

被引：65

作者：

Jeong, JH ^{[1
]}

Choi, YS

Shin, YJ

Lee, JJ

Park, KT

Lee, ES

Lee, SR

机构：

[1] Korea Inst Machinery & Mat, Dept Intelligent Precis Machine, Taejon 306600, South Korea

[2] KyungWon Tech Corp, Seoul 137841, South Korea

来源：

FIBERS AND POLYMERS | 2002年 / 3卷 / 03期

关键词：

nanoimprint lithography; embossing stage; capillary force; surface tension; numerical simulation;

D O I：

10.1007/BF02892627

中图分类号：

TB3 [工程材料学]; TS1 [纺织工业、染整工业];

学科分类号：

0805 ; 080502 ; 0821 ;

摘要：

Nanoimprint lithography (NIL) is a nanofabrication method known to be a low cost method of fabricating nano scale patterns as small as 6 nm. This study is focused on understanding physical phenomena in the embossing of nano/micro scale structures with 100 nm minimum feature size. We present the effects of capillary force and width of stamp groove on flow behavior at the embossing stage through numerical experimentation. We also compare our numerical results with previous, experimental results and discuss our results.

引用

页码：113 / 119

页数：7