Pd nanoparticles as a new activator for electroless copper deposition

被引:27
作者
Lee, CL [1 ]
Wan, CC [1 ]
Wang, YY [1 ]
机构
[1] Natl Tsing Hua Univ, Dept Chem Engn, Hsinchu 30043, Taiwan
关键词
D O I
10.1149/1.1542899
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Pd nanoparticles were synthesized and finely controlled by the proper choice of surfactants with different carbon chain lengths. The feasibility of using this newly synthesized Pd nanoparticles as an activator for electroless copper deposition was examined. In this study, copper was successfully deposited on a wafer with a 0.25 mum microtrench. In addition, the effects of the surrounding functional group and the particle size on the kinetics of electroless copper deposition were studied by electrochemical quartz crystal microgravimetry. The performance of Pd nanoparticles was also compared with the traditional Pd/Sn colloid-type activator. (C) 2003 The Electrochemical Society.
引用
收藏
页码:C125 / C130
页数:6
相关论文
共 31 条
[21]   LIGAND EFFECTS IN ELECTROLESS COPPER DEPOSITION [J].
PAUNOVIC, M .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (03) :349-354
[22]  
Paunovic M., 1998, ELEC SOC S, V2nd, DOI 10.1002/0470009403
[23]   VISUALIZATION OF SURFACTANTS ON NANOSTRUCTURED PALLADIUM CLUSTERS BY A COMBINATION OF STM AND HIGH-RESOLUTION TEM [J].
REETZ, MT ;
HELBIG, W ;
QUAISER, SA ;
STIMMING, U ;
BREUER, N ;
VOGEL, R .
SCIENCE, 1995, 267 (5196) :367-369
[24]  
SCHERRER P, 1918, NACHR KONIGL GES MP, V98
[25]   ELECTROLESS COPPER DEPOSITION FOR ULSI [J].
SHACHAMDIAMAND, Y ;
DUBIN, V ;
ANGYAL, M .
THIN SOLID FILMS, 1995, 262 (1-2) :93-103
[28]  
Taylor A., 1961, XRAY METALLOGRAPHY
[29]   IMPEDANCE STUDIES OF COPPER IN ALKALINE-SOLUTIONS, ESPECIALLY DURING ELECTROLESS PLATING [J].
WANNER, M ;
WIESE, H ;
WEIL, KG .
BERICHTE DER BUNSEN-GESELLSCHAFT-PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 1988, 92 (06) :736-745
[30]   SIZE-DEPENDENT CATALYTIC ACTIVITY OF SUPPORTED METAL-CLUSTERS [J].
XU, Z ;
XIAO, FS ;
PURNELL, SK ;
ALEXEEV, O ;
KAWI, S ;
DEUTSCH, SE ;
GATES, BC .
NATURE, 1994, 372 (6504) :346-348