Energy-dispersive X-ray reflectivity and GID for real-time growth studies of pentacene thin films

被引:53
作者
Kowarik, S. [1 ]
Gerlach, A.
Leitenberger, W.
Hu, J.
Witte, G.
Woell, C.
Pietsch, U.
Schreiber, F.
机构
[1] Univ Tubingen, Inst Angew Phys, D-72076 Tubingen, Germany
[2] Univ Oxford, Oxford OX1 3QZ, England
[3] Univ Potsdam, Inst Phys, D-14469 Potsdam, Germany
[4] Ruhr Univ Bochum, D-44780 Bochum, Germany
[5] Univ Siegen, D-57068 Siegen, Germany
基金
英国工程与自然科学研究理事会;
关键词
X-ray diffraction; X-ray reflectivity; organic semiconductors; real-time monitoring;
D O I
10.1016/j.tsf.2006.12.020
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We use energy-dispersive X-ray reflectivity and grazing incidence diffraction (GID) to follow the growth of the crystalline organic semiconductor pentacene on silicon oxide in-situ and in real-time. The technique allows for monitoring Bragg reflections and measuring X-ray growth oscillations with a time resolution of 1 min in a wide q-range in reciprocal space extending over 0.25-0.80 angstrom(-1), i.e. sampling a large number of Fourier components simultaneously. A quantitative analysis of growth oscillations at several q-points yields the evolution of the surface roughness, showing a marked transition from layer-by-layer growth to strong roughening after four monolayers of pentacene have been deposited. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:5606 / 5610
页数:5
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