Ferroelectric properties of Al-doped lead titanate zirconate thin films prepared by chemical solution deposition process

被引:11
作者
Iijima, T
He, G
Wang, Z
Tsuboi, H
Hiyama, K
Okada, M
机构
[1] Tohoku Natl Ind Res Inst, AIST, MITI, Miyagino Ku, Sendai, Miyagi 9838551, Japan
[2] YAMAHA Co, Mat & Components Dev Ctr, Toyooka 4380192, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2000年 / 39卷 / 9B期
关键词
thin film; PZT Al doping; ferroelectric properties; leakage current; fatigue property; chemical solution deposition process;
D O I
10.1143/JJAP.39.5426
中图分类号
O59 [应用物理学];
学科分类号
摘要
2.5 and 5 mol% Al were doped to lead titanate zirconate (PZT) thin films using a chemical solution deposition process, and ferroelectric properties of Al-doped PZT thin films were compared with those of nondoped PZT film. Doped Al seems to be substituted at the Zr/Ti site (B site) since the c/a ratio decreased with increasing Al content. The shape of a P-E hysteresis curve of the thin films did not show remarkable differences between nondoped and Al-doped PZT. Values of P-s, P, and E-c of the 2.5 mol% Al-doped PZT thin films were about 43 muC/cm(2), 19 muC/cm(2) and 58 kV/cm, respectively. On the other hand, the leakage current of the thin films showed a tendency to decrease with increasing Al content. The fatigue properties of the Al-doped PZT thin film showed a slight improvement, because the reduction rate of the fatigue was smaller than that of a nondoped PZT thin film.
引用
收藏
页码:5426 / 5428
页数:3
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