Comparisons of physical and chemical sputtering in high density divertor plasmas with the Monte Carlo Impurity (MCI) transport model

被引:2
作者
Evans, TE [1 ]
Finkenthal, DF
Loh, YS
Fenstermacher, ME
Porter, GD
West, WP
机构
[1] Gen Atom Co, San Diego, CA USA
[2] Palomar Coll, San Marcos, CA USA
[3] Harvard Univ, Cambridge, MA 02138 USA
[4] Univ Calif Lawrence Livermore Natl Lab, Livermore, CA USA
关键词
D O I
10.1002/ctpp.2150380139
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The MCI transport model was used to compare chemical and physical sputtering for a DIII-D divertor plasma near detachment, With physical sputtering alone the integrated carbon influx was 8.4 x 10(19) neutrals/s while physical plus chemical sputtering produced an integrated carbon influx of 1.7 x 10(21) neutrals/s. The average carbon concentration in the computational volume increased from 0.012% with only physical sputtering to 0.182% with both chemical and physical sputtering. This increase in the carbon inventory produced mon radiated power which is in better agreement with experimental measurements.
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收藏
页码:260 / 265
页数:6
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