Fabrication of planar thermocouples for real-time measurements of temperature profiles in polymer melts

被引：30

作者：

Debey, D ^{[1
]}

Bluhm, R ^{[1
]}

Habets, N ^{[1
]}

Kurz, H ^{[1
]}

机构：

[1] RHEIN WESTFAL TH AACHEN,INST PLAST PROC,AACHEN,GERMANY

来源：

SENSORS AND ACTUATORS A-PHYSICAL | 1997年 / 58卷 / 03期

关键词：

miniaturization; planar thermocouples; spatial resolution; response time;

D O I：

10.1016/S0924-4247(97)01389-7

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Thin-film thermocouples are promising candidates for real-time temperature-profile measurements with high spatial resolution They are interesting for mass production because the production costs of these elements are rather low. Miniaturized thermocouple elements with 10 measuring points per 2 mm have been fabricated by standard photolithography and etch technology. Sensors with different metal combinations on various substrates are tested with respect to their sensitivity and speed. The best sensitivity is achieved with an Au/Al metallization on polyimide substrates. The time constant of the thermocouple response is 0.15 s on polyimide and 0.5 s on ceramic substrates. These thermocouples are applied to investigate the cooling processes of plastic materials within the cavity of an injection mould.

引用

页码：179 / 184

页数：6

共 10 条

[1]

BLUHM R, 1996, THESIS TU AACHEN AAC, P37

[2]

BLUHM R, 1994, MEASURING TEMPERATUR, V10, P5

[3]

FRANKE H, 1969, THERMOELEKTRIZITAET, V3, P1685

[4]

KORTVELYESSY LV, 1987, THERMOSPANNING THERM, P16

[5] REACTIVE SPUTTER ETCHING AND REACTIVE ION MILLING-SELECTIVITY, DIMENSIONAL CONTROL, AND REDUCTION OF MOS-INTERFACE DEGRADATION [J].

MEUSEMANN, B .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1886-1888

[6]

MOGAB CJ, 1983, DRY ETCHING VLSI TEC, P319

[7]

OBENDRAUF K, 1993, SCHNELLE TEMPERATURM, P971

[8]

ONG GD, 1986, MODERN MOS TECHNOLOG, P175

[9]

*TU AACH I PLAST P, 1995, CADMOULD SOFTW SIM I

[10]

VOSSEN JL, 1978, THIN FILM PROCESSES, P465

← 1 →